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The development course

  1. 2013

    Obtained ISO/TS 16949:2009 standard certification

     
  2. 2012

    Obtained ISO14001, GB/T28001 environmental safety and product ROHS certification

    Completed the construction of the second 8-inch epitaxial SOI and 6-8 inch thick film production line

     
  3. 2011

    Completed the ISO9001 quality management system

    Started the construction of the second phase 8-inch epitaxial SOI and 6-8 inch thick film SOI production line

     
  4. 2010

    Complete 8-inch thin film SOI project

     
  5. 2009

    Started the construction of an 8-inch thin film SOI production line

     
  6. 2004

    Shenyang Silicon-based Technology Co., Ltd. was officially established with the introduction of US Joint Wafer TM-SOI patent technology. It is located in the Weinan Export Processing Zone of Shenyang City.