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EPI

According to the needs of customers, we provide high quality MOS, SOI, buried layer epitaxy.

The wafer size: 8 ".

Annual production capacity: 100 k.

Level of clean room: 10 levels.

Epitaxial process equipment: ASM 2000 Plus

Technical features:

Silicon-based technology has now formed a domestic first-class epitaxy technology team, adequate technical personnel reserve and professional talent training mechanism. At the same time, the extension of silicon-based technology has also set up perfect product development, process, quality tracking system. The entire process, of the augmented product is under SPC control, to achieve the overall control of the production process. We have the ability to provide customers with comprehensive technical support and thoughtful products and services. We will also deep technology development cooperation with the customers, common to complete the development and production of new technology transformation.